Objectives
Advances in analytical instrumentation and nanometrology have been the key to the remarkable progress in nanoscience and nanotechnology research over the last two decades. Detailed knowledge of the physical, chemical, mechanical, electronic, photonic and magnetic properties is required in all phases of the development from exploratory research to concept and prototyping and finally manufacturing. However, the resolution, sensitivity, accuracy and analytical information provided by the existing analytical techniques are often stretched to the limits and will not at all be able to meet the future demands of the industry.
The scanning probe techniques and especially Scanning Force Microscopy (SFM) in its various operation modes are widely used in nanosciences and can yield information on nanostructures with superb lateral and vertical resolution down to the atomic scale, but they lack the true chemical information which is often needed. On the other hand, all ex- isting techniques for the chemical analysis of surfaces, interfaces and
three-dimensional structures using electron, ion or photon beams have severe limitations either in lateral resolution, depth resolution or in sensitivity. An even larger gap exists for the chemical nanoanalysis of organic materials and molecular devices with high lateral resolution.
To close these gaps the consortium consisting of several well-established partners of the Network of Excellence “NanoBeams” of the FP6 programme who are leading in the field of time-of-flight secondary ion mass spectrometry (ToF-SIMS) and scientific partners with a high level of expertise in scanning force microscopy (SFM) have developed an exciting, totally new analytical concept.
The 3D NanoChemiscope NMP project started on 15th September 2008, under the 7th Framework Programme of the European Commission. Its aim is to develop an innovative and novel combination of a new TOF-SIMS with substantially optimized lateral resolution of down to at least 10 nm and with improved sensitivity, combined with a new high resolution ultra-high vacuum SFM. For the first time ever, the combination of the two techniques will provide as of yet unavailable complementary information on nanoscale surface chemistry and surface morphology in one machine at the same time.
For the analysis of ultra-thin layers and 3D nanostructures, material will be removed layer by layer in a very controlled way by using ultra low energy sputtering, cluster sputtering techniques and nano-mechanical machining with the SFM tip. The topography at the surface and at various depths will be quantitatively measured in-situ by the depth calibrated SFM. Joined by a novel software for the calculation and display of 3-dimensional distributions of all chemical species, this leads to a totally new and highly innovative „3D NanoChemiscope“ with broad multidisciplinary application areas.
With a total budget of 4 M € and a duration of 4 years (2008- 2012) this multidisciplinary project is based on the complementary know-how of the involved partners to overcome the known nanoanalytical limitations and to address problems such as molecular 3D analysis, which are not yet solvable by any of the existing techniques. All aspects from fundamental research to applications, metrology and standardisation are well-ad- dressed and well-balanced in this project.
Supported by FP 7 of the European Commission